000 | 00962nam a2200289zi 4500 | ||
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003 | $$aDLC | ||
005 | 20230201161200.0 | ||
008 | 001024c 1998ge a b 001 0 eng | ||
020 | _a3540616721 (papel alcalino) | ||
035 | _aMX001000862243 | ||
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_aDLC _cDLC _dDLC |
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_aTK7871.85 _bU57 |
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_a621.3815/2 _221 |
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_aUltraclean surface processing of silicon wafers : _bsecrets of VLSI manufacturing / _cTakeshi Hattori (ed.) |
300 |
_axxviii, 616 páginas : _bilustraciones ; |
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504 | _aIncluye referencias bibliograficas e indice | ||
650 | 0 |
_aLáminas semiconductoras _xLimpieza |
|
650 | 0 |
_aSilicio _xSuperficies |
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650 | 0 | _aTratamiento de superficies | |
700 | 1 |
_aHattori, Takeshi, _d1945- , _eeditor |
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264 | 1 |
_aBerlin : _bSpringer Verlag, _cc1998 |
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336 |
_atexto _2rdacontent |
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337 |
_asin medio _2rdamedia |
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338 |
_avolumen _2rdacarrier |
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_c2391 _d2391 |