| 000 | 00851nam a2200253zi 4500 | ||
|---|---|---|---|
| 005 | 20230201161153.0 | ||
| 008 | 040830D1994ENG0 11 | ||
| 020 | _a0125330189 | ||
| 035 | _aMX001000697602 | ||
| 041 | _aSPA | ||
| 050 |
_aQC176.84 _bP53 |
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| 245 | 0 | 0 |
_aPlasma sources for thin film deposition and etching / _ced. by Maurice H. Francombe, John L. Vossen |
| 300 | _avi, 323 páginas | ||
| 490 | 0 |
_aPhysics of thin films : advances in research and development ; _vv. 18 |
|
| 650 | _aPelículas delgadas | ||
| 650 | _aPlasma (Gases ionizados) | ||
| 700 | 1 |
_aFrancombe, Maurice H., _eeditor |
|
| 700 | 1 |
_aVossen, John L., _eeditor |
|
| 264 | 1 |
_aSan Diego, California : _bAcademic, _cc1994 |
|
| 336 |
_atexto _2rdacontent |
||
| 337 |
_asin medio _2rdamedia |
||
| 338 |
_avolumen _2rdacarrier |
||
| 999 |
_c1708 _d1708 |
||