| 000 | 01135nam a2200277zi 4500 | ||
|---|---|---|---|
| 005 | 20230201161146.0 | ||
| 008 | 970106s1990 xxu 100 0 eng | ||
| 020 | _a1558990534 | ||
| 035 | _aMX001000554040 | ||
| 050 |
_aTS695.15 _bC43 |
||
| 245 | 0 | 0 |
_aCharacterization of plasma-enhanced cvd processes : _bSymposium held november 27-28, 1989, boston, massachusetts, usa / _cEd. Gerald lucovsky, dale e. ibbotson, dennis w. hess |
| 300 | _a250 páginas | ||
| 490 | 0 |
_aMaterials Research Society symposium proceedings ; _vv. 165 |
|
| 650 |
_aDeposición química de vapor asistida por plasma _vCongresos |
||
| 650 |
_aCircuitos integrados _xDiseño y construcción _vCongresos |
||
| 700 |
_aLucovsky, G. _eeditor |
||
| 700 |
_aIbbtson, Dale E. _eeditor |
||
| 700 |
_aHess, Dennis W., _eeditor |
||
| 710 | 2 | _aMaterials Research Society | |
| 830 | 0 |
_aMaterials Research Society symposium proceedings _x0272-9172 |
|
| 264 | 1 |
_aPittsburgh, pennsylvania : _bMaterials research society, _cc1990 |
|
| 336 |
_atexto _2rdacontent |
||
| 337 |
_asin medio _2rdamedia |
||
| 338 |
_avolumen _2rdacarrier |
||
| 999 |
_c1053 _d1053 |
||