TY - BOOK AU - Francombe,Maurice H. AU - Vossen,John L. TI - Plasma sources for thin film deposition and etching T2 - Physics of thin films : advances in research and development SN - 0125330189 AV - QC176.84 P53 PY - 1994/// CY - San Diego, California PB - Academic KW - PelĂ­culas delgadas KW - Plasma (Gases ionizados) ER -