Plasma sources for thin film deposition and etching / 
ed. by Maurice H. Francombe, John L. Vossen 
 - vi, 323 páginas 
 - Physics of thin films : advances in research and development ;  v. 18 .
<br/><br/><label>ISBN: </label>0125330189 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Películas delgadas<br/>Plasma (Gases ionizados)
<br/><br/><label>LC Class. No.: </label>QC176.84  / P53