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Plasma sources for thin film deposition and etching / ed. by Maurice H. Francombe, John L. Vossen - vi, 323 páginas - Physics of thin films : advances in research and development ; v. 18 .

ISBN: 0125330189

Subjects--Topical Terms:
Películas delgadas
Plasma (Gases ionizados)

LC Class. No.: QC176.84 / P53